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Glove box Product List and Ranking from 74 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Feb 04, 2026～Mar 03, 2026
This ranking is based on the number of page views on our site.

Glove box Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Feb 04, 2026～Mar 03, 2026
This ranking is based on the number of page views on our site.

  1. 神港精機 東京支店 Tokyo//Industrial Machinery
  2. アイビック・リサーチ Ibaraki//Testing, Analysis and Measurement
  3. 万善工機 Tokyo//Testing, Analysis and Measurement
  4. 4 ワッティー Tokyo//Industrial Electrical Equipment
  5. 5 UNICO 　　東京技術センター(Ｔ.Ｔ.Ｃ) Tokyo//Manufacturing and processing contract
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Glove box Product ranking

Last Updated： Aggregation Period:Feb 04, 2026～Mar 03, 2026
This ranking is based on the number of page views on our site.

  1. Contract film deposition service for experimental and research development purposes: "ALD (Atomic Layer Deposition) Equipment" ワッティー
  2. Powder Artificial Gastric Juice Artificial Intestinal Juice BioWise アイビック・リサーチ
  3. Inert Gas Circulation Purification Device MF-70 UNICO 　　東京技術センター(Ｔ.Ｔ.Ｃ)
  4. ICP etching equipment RIE-800iPC/RIE-400iPC サムコ
  5. 4 Hydrogen annealing device (for electronic devices, currently supporting sample testing) 神港精機 東京支店

Glove box Product List

1～30 item / All 227 items

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General-purpose glove box

General-purpose glove box

A box capable of adjusting the oxygen and moisture atmosphere within the necessary box.

The "General Use Glove Box" is a box that allows for the adjustment of the oxygen and moisture atmosphere inside the box according to the combination of options suited for the intended use. Our company participates from the planning stage to streamline production lines that are directly linked to our customers' management. We propose optimal automation and labor-saving solutions. 【Features】 ■ It is possible to adjust the oxygen and moisture atmosphere inside the box according to the combination of options suited for the intended use. *For more details, please feel free to contact us.

  • Glove box
  • Glove box

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Absolute humidity dew point thermometer / Model number MI1T-3321

Absolute humidity dew point thermometer / Model number MI1T-3321

The MI1T-3321 temperature and humidity meter is a high-precision multifunction digital thermometer and hygrometer that can measure temperature, humidity, absolute humidity, dew point temperature, and wet bulb temperature all in one device.

It quickly displays humidity using the latest high-precision resistive humidity sensor.

  • others
  • Other electronic measuring instruments
  • Glove box

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Dew Point Control Dry Glove Box "Euphony Ace"

Dew Point Control Dry Glove Box "Euphony Ace"

Ultra-low dew point dry air glove box as a replacement for inert gas type.

The dew point control dry glove box "Euphony Ace" accurately creates a wide range of testing environments with a single device. It allows for quality evaluation from ultra-low dew point environments in the research phase to practical low-cost production environments. Additionally, it can maintain a dew point control accuracy within ±1.5°C stably over a long period, providing reliable experimental data. 【Features】 ○ Affordable price and low running costs for peace of mind ○ Low noise, safe for use in laboratories ○ Uses dry air for safety and reassurance For more details, please contact us or download the catalog.

  • Glove box
  • Glove box

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Multi-purpose sputtering device

Multi-purpose sputtering device

Support from research and development to mass production!

Supported by highly reliable standard hardware and a wealth of experience, Shinko Seiki has been active in many fields since launching its first machine in 1967. We provide state-of-the-art equipment that consistently leads the way with flexible and advanced software.

  • Sputtering Equipment
  • Printed Circuit Board
  • Other semiconductors
  • Glove box

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Annealing device "Variable Atmosphere Heat Treatment Device"

Annealing device "Variable Atmosphere Heat Treatment Device"

Capable of processing various substrates such as wafers and glass; a variable atmosphere heat treatment device compatible with a wide range of applications (supports sample testing in O2 or H2 atmosphere annealing).

We offer a rapid temperature rise and fall type "horizontal annealing device" that can be processed in vacuum, oxygen atmosphere (at atmospheric pressure), and reducing atmosphere (at atmospheric pressure). It is capable of processing various substrates (wafers, ceramics, glass, mounted substrates) up to 6 inches, and has a proven track record in applications such as annealing of thin films and wafers, firing of nano metal pastes, and curing of organic materials. For those who wish to evaluate our equipment, we offer sample testing. Please contact us for details on specifications and available test contents. 【Features】 ■ Uniform heating treatment in various atmospheres (vacuum, N2, O2, H2) (up to 900°C) ■ Rapid cooling through the movement of the heating furnace body ■ Processing in a clean atmosphere using quartz tubes ■ Wide range of application support *For more details, please feel free to contact us.

  • Other physicochemical equipment
  • Heating device
  • Glove box

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ICP metal etching equipment

ICP metal etching equipment

Supports etching of fine patterns of metal films such as Al and Cr! Demo machines available! Facility tours and sample testing are currently being conducted.

The "ICP Metal Etching Device" is a high-density plasma etching device compatible with metal films, designed for advanced thin film processes. It actively supports not only general devices such as semiconductors and MEMS but also special processes like surface treatment for exposure masks and metal substrates. Thanks to its unique chamber structure, it achieves metal etching with low particle contamination at the nm level, characterized by high yield and operational efficiency. 【Features】 ■ Precision etching of metal films at the nm level ■ Low particle process through a unique mechanism ■ Process compatibility for a wide range of applications, including metal films and compound semiconductor substrates ■ High reliability of hardware leveraging the basic configuration of "SERIO" for nanoimprint molds ■ Active support for not only wafers but also special materials and shaped substrates *For more details, please refer to the PDF document or feel free to contact us.

  • Etching Equipment
  • Plasma surface treatment equipment
  • Glove box

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Batch-type plasma reflow device (flux reflow)

Batch-type plasma reflow device (flux reflow)

Flux-free reflow device for fine wafer bumps. Sample test compatible, achieving energy-saving and short takt processes. Reflow video available.

Achieving flux-free bump reflow with highly reducing H2 radicals generated by high-density plasma (SWP). Reducing the application and cleaning processes of flux. Minimizing wet processes before and after reflow. An energy-saving, space-saving, and clean process that reduces the space, processing, and utilities of wet equipment. A cutting-edge mass production process compatible with 300mm wafers, suitable for batch-type hardware and niche devices with small-diameter substrates. Supporting short-tact batch processing for small-lot production and R&D applications.

  • Other semiconductor manufacturing equipment
  • Glove box

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Batch-type vacuum soldering device (fluxless reflow vacuum reflow)

Batch-type vacuum soldering device (fluxless reflow vacuum reflow)

Achieving fluxless, voidless reflow from power modules to wafer bumps. New model launched for upgraded quality! *Currently supporting sample testing.

Batch-type vacuum soldering equipment that achieves high-reliability soldering. High-speed and uniform soldering in a low-oxygen atmosphere through vacuum evacuation. Achieves a high level of void-free soldering through combinations of vacuum, atmospheric pressure, and various atmospheres (reduction, inert). A basic model of the standard process for high-reliability power modules for automotive applications. A new model has been introduced to increase processing capacity and performance. The new model has been installed at the factory. Actively responding to equipment tours and sample tests. Conducting void-free, flux-free soldering tests, including plasma cleaning for pre-treatment. ★ We will exhibit at NEPCON Japan 2020! * For more details, please refer to the PDF document or feel free to contact us.

  • Reflow Equipment
  • Soldering Equipment
  • Electric furnace
  • Glove box

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Polyimide cure device (300mm wafer compatible clean bake device)

Polyimide cure device (300mm wafer compatible clean bake device)

300mm wafer-compatible polyimide cure, baking, low-temperature annealing, compatible with multilayer substrates. Thermal processing equipment for mass production of advanced electronic devices.

High uniformity hot air heating in a low oxygen atmosphere (N2) after vacuum replacement. Heating treatment of 300mm wafers in cassette units. Compatible with system LSI polyimide curing and flexible printed circuit board curing/annealing. Achieving both high quality and mass production with curing of 300mm wafer cassette units.

  • Annealing furnace
  • Glove box

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Standard Batch Type Sputtering Device (SRV Series)

Standard Batch Type Sputtering Device (SRV Series)

Multi-functional, compact, flexible support, a standard lineup with proven results and trust.

A standard batch-type sputtering series that incorporates a three-element cathode into a compact housing. It covers the film deposition process for various electronic devices and related materials from basic development to mass production, thanks to a wide uniform range of film thickness distribution and an automatic control mechanism. Our film deposition processes and options, supported by numerous delivery records, will reliably meet your requirements.

  • Sputtering Equipment
  • Plasma surface treatment equipment
  • Glove box

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Research and development sputtering equipment

Research and development sputtering equipment

Compact, low-cost, and feature-rich, low-cost sputtering equipment for research and development. Sample testing and facility tours available.

Realization of the capabilities of a higher-end model capable of small-scale production using a manually operated simple experimental machine. An 8-inch compatible multi-frequency RF sputtering device. Supports fundamental research in MEMS, compound semiconductors, and electronic devices due to high-speed exhaust and excellent process performance. A series of batch-type sputtering devices with a proven track record in mass production of electronic components.

  • Sputtering Equipment
  • Glove box

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SDR-type roll-to-roll sputtering device (RtoR type sputtering device)

SDR-type roll-to-roll sputtering device (RtoR type sputtering device)

Currently responding to sample tests, developing films and metal foils for flexible devices and advanced functional materials, and supporting mass production. Process support with demo equipment.

Achieving mass production of flexible electronic devices represented by FPC with proven results. Reliable response to various individual requirements through process support using in-house demonstration equipment. Proven results with a wide range of substrates, including not only general resin films but also metal foils. Stable operation is realized through a high-utilization cathode developed in-house and a well-established transport mechanism. Equipped with a variety of optional mechanisms such as plasma pre-treatment electrodes, cathodes for magnetic materials, and main rolls for substrate heating, it can be operated as a multipurpose continuous film processing device. Flexible realization of hardware and software according to purpose and application, including small machines for R&D and batch-type equipment compatible with sheets.

  • Other processing machines
  • Sputtering Equipment
  • Plasma surface treatment equipment
  • Glove box

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Mass production compatible batch-type sputtering system (Model STH10311)

Mass production compatible batch-type sputtering system (Model STH10311)

A batch-type sputtering device equipped with four substrate holders for φ410 substrates, achieving excellent film thickness uniformity within ±5% in the same substrate holder.

This is a batch-type sputtering device that achieves both processing capacity for mass production and excellent film thickness uniformity by adopting multiple self-rotation substrate stages. Despite being a chamber system exceeding 1 meter due to the side sputtering method, it enables easy attachment and detachment of substrates and targets, as well as simplified maintenance within the vacuum chamber. It incorporates essential considerations for mass production equipment, such as a data logging system optimal for mass production and control interface software that facilitates device control and management. It balances quality and throughput for large substrates represented by 300 mm wafers, as well as for the mass production of small electronic components like resistors and sensors.

  • Sputtering Equipment
  • Glove box

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Simple experimental deposition device (EM-645 type)

Simple experimental deposition device (EM-645 type)

Simple, compact, high-performance; ideal for experiments and basic research; flexibly customizable according to user needs; standard-type deposition device.

Covers all performance, cost, and technical support required for basic research, and can be customized according to individual requirements.

  • Evaporation Equipment
  • Other physicochemical equipment
  • Other surface treatment equipment
  • Glove box

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Standard Batch Type Vapor Deposition Equipment (AMF Series)

Standard Batch Type Vapor Deposition Equipment (AMF Series)

Standard series for electronic device applications. A reliable and comprehensive lineup ranging from multipurpose small research units for R&D to mass production for well-established back electrode applications.

A lineup of standard deposition equipment that broadly supports everything from research and development of semiconductors, MEMS, and various electronic components (sensors, quartz oscillators, etc.) to full-scale mass production. All models are compatible with clean rooms and clean vacuum environments, equipped with various selection mechanisms. We respond meticulously to individual requests based on our extensive experience with standard specifications. Customization is available for evaporation sources, heating temperatures, substrate mechanisms (planetary dome, rotary dome), operation, and logging software. We also offer process testing with in-house demo units, providing a wide range of flexible hardware and support.

  • Evaporation Equipment
  • Other surface treatment equipment
  • Glove box

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AlN template creation device (sputtering device for oriented AlN films)

AlN template creation device (sputtering device for oriented AlN films)

AlN templates for UV-LEDs using sputtering. AlN films with high crystallinity and C-axis orientation can be created by sputtering. Latest model deposition equipment.

A AlN template on a sapphire substrate necessary for reducing the manufacturing cost of UV-LEDs is created by sputtering. An AlN film with a C-axis orientation of less than 100 arc/sec is formed by sputtering at low temperatures (below 700°C). This contributes to the cost reduction of UV-LEDs with a simple and stable process and high throughput. Sample testing is currently underway, and development for expansion into high-frequency devices is also in progress.

  • Sputtering Equipment
  • Plasma surface treatment equipment
  • Glove box

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Multi-chamber sputtering device

Multi-chamber sputtering device

A lineup with over 20 years of proven history. Customized processes and hardware for high-end niche processes from R&D to mass production.

Actively responding to various applications and substrates that are difficult to accommodate with standard specifications. Dedicated mechanisms are prepared for many substrates, including R&D, discrete components, compounds, MEMS, packaging, assembly processes, masks, and small FPDs. Tray transport of substrates is also standard, enabling film deposition and processing of different types of substrates on the same device through atmospheric substrate handling. In addition to application-specific cathodes (wide erosion, ferromagnetic materials, oxides, reactive types), we support a wide range of applications with special substrate mechanisms (high-temperature heating, magnetic field application, cooling, etc.). Dedicated devices are individually designed based on process tests using in-house demonstration machines.

  • Sputtering Equipment
  • Plasma surface treatment equipment
  • Glove box

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Electrode film annealing device for compound semiconductors (variable atmosphere heat treatment device)

Electrode film annealing device for compound semiconductors (variable atmosphere heat treatment device)

A quartz tube type annealing device commonly used for alloying and reducing resistance of electrode films in compound semiconductors. It is a high-temperature processing type equipped with a rapid cooling mechanism. It is also compatible with transparent electrode films.

Customizing an annealing device with extensive experience in Si processes for compound semiconductor processes. Capable of high temperatures (900-1000°C) compared to hot plate types for GaAs. Proven results in the alloying of electrodes for nitride semiconductor films. Equipped with a rapid temperature rise and fall heating furnace to control the annealing of electrode films with uniform heating and optimal temperature profiles. A heat treatment device for wafer processes with a proven track record that can propose optimal equipment configurations based on production volume and processes.

  • Annealing furnace
  • Heating device
  • Glove box

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SiC coating device (AF-IP device)

SiC coating device (AF-IP device)

A dense SiC (silicon carbide) film with excellent wear resistance and oxidation resistance is formed using PVD. A thick film (7 μm) is formed using a new ion plating method.

Achieved SiC film formation using a PVD method that was not previously available through a newly developed arc filament-type ion plating method. Adopted a new film formation technology that enables the formation of dense SiC films with excellent wear resistance and oxidation resistance at low temperatures below 400°C. The ion plating method, using solid silicon as the starting material, realizes a simple and environmentally friendly clean process with low environmental impact. The new film formation equipment offers high control over film thickness and quality, and excels in exhaust gas treatment, maintenance, installation area, and running costs compared to CVD.

  • Other machine tools
  • Other processing machines
  • Plasma surface treatment equipment
  • Glove box

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Metal nanopaste sintering bonding compatible vacuum soldering device

Metal nanopaste sintering bonding compatible vacuum soldering device

A new model of Shinko Precision's vacuum soldering device has arrived, enhancing the quality of metal sintering joints with excellent thermal uniformity, temperature rise characteristics, and atmosphere control. This is a next-generation high-reliability sintering bonding device.

The vacuum soldering equipment from Shinko Seiki, which supports the production of power device modules, has been upgraded. It improves the heating and cooling characteristics and expands the processing dimensions. It accommodates the sintering bonding of metal paste through the conventional atmosphere control performance and the increase in processing temperature. The realization of low oxygen concentration and the reducing power of a 100% hydrogen atmosphere significantly enhance the wettability by preventing the oxidation of wet paste. The addition of an optional heating and pressurizing mechanism also enables void-free bonding. Shinko Seiki's new vacuum soldering equipment is compatible with next-generation bonding materials.

  • Annealing furnace
  • Reflow Equipment
  • Industrial Furnace
  • Glove box

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Plasma Lava Coating Device (STV6301 Sputtering Device)

Plasma Lava Coating Device (STV6301 Sputtering Device)

Coating Sakurajima lava with the latest plasma technology. Naturally derived functional surface treatment. Achieving new functions such as various vegetation and hydrophilicity for all types of equipment.

Coating Sakurajima lava using magnetron sputtering. Application of naturally derived lava for advanced surface treatment. Formation of thermally and chemically stable thin films utilizing the properties of lava. Realization of decorative films (transparent and interference colors) and hydrophilic films on various materials (metal, glass, fiber). Being a natural material, it does not cause allergies in humans and prevents alteration and discoloration of the material. It has been put into practical use for surface treatment of tableware, and market expansion is expected. Additionally, it excels in infrared light transmittance, and development for fiber coating is also anticipated. A lava coating with excellent energy-saving performance and environmental resistance, applied uniformly to three-dimensional shapes. A new era of surface treatment equipment.

  • Sputtering Equipment
  • Glass
  • fiber
  • Glove box

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Conveyor-type jet far-infrared conveyor furnace

Conveyor-type jet far-infrared conveyor furnace

By combining far infrared rays and hot air jet spraying, workpieces can be heated and processed in a short time.

Examples of use include curing for printing and moisture drying, making it particularly suitable for plate-shaped and sheet-shaped workpieces.

  • Drying Equipment
  • Electric furnace
  • Glove box

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Conveyor-type belt infrared and hot air combined conveyor furnace

Conveyor-type belt infrared and hot air combined conveyor furnace

It is a high-efficiency device that can utilize far-infrared effects while maintaining a constant ambient temperature.

Combined a far infrared heater with an emissivity of over 90% and a hot air fan heater.

  • Electric furnace
  • Drying Equipment
  • Glove box

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Conveyor-type wicket hot air circulation conveyor furnace

Conveyor-type wicket hot air circulation conveyor furnace

We aim for complete automation of the line with the introduction of wickets.

It is possible to transport and dry printed circuit boards and sheet-like printed materials by standing them up in a dedicated jig. Complete automation of the line from the printing machine to the stocker is achievable.

  • Drying Equipment
  • Electric furnace
  • Glove box

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Vacuum Glove Box Model VG-800

Vacuum Glove Box Model VG-800

Vacuum Glove Box Model VG-800

This is a glove box made of transparent acrylic, offering excellent visibility. The internal vacuum allows for efficient gas replacement. It comes with a pass box, making it convenient to transfer equipment samples during work.

  • Other physicochemical equipment
  • Glove box

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Anaerobic glove box (anaerobic chamber)

Anaerobic glove box (anaerobic chamber)

Anaerobic glove box (anaerobic chamber)

This is an anaerobic glove box made of transparent acrylic, offering excellent visibility. Customization is available to accommodate changes in dimensions and the installation of other devices based on customer requests.

  • Glove box
  • Glove box

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Gas replacement glove box

Gas replacement glove box

Gas displacement glove box

This is a gas replacement glove box with excellent visibility. The left side has a door, making it easy to place equipment inside. *Included accessories: 1 pair of latex long gloves, 4 needle valves, 1 vacuum gauge (pass box) *External dimensions (mm): 1130W × 586D × 650H *Effective internal dimensions (mm): 689W × lower edge 530D / upper edge 240D × 480H *Effective internal dimensions of the pass box (mm): 230W × 200D × 200H *Weight: approximately 40kg

  • Glove box
  • Glove box

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Low Dew Point Glove Box

Low Dew Point Glove Box

Low Dew Point Glove Box

This is a low dew point glove box made of transparent acrylic, offering excellent visibility. It creates a low dew point environment by evacuating the interior and replacing it with inert gas. * External dimensions (mm): 983W × 675D × 655H * Effective internal dimensions (mm): 600W × 240D (top edge) / 400D (bottom edge) × 450H * Pass box internal dimensions (mm): 250W × 200D × 200H * Weight of the glove box body: approximately 80kg * Nozzle diameter of the vacuum valve: φ9mm

  • Glove box
  • Glove box

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Desktop vacuum glove box

Desktop vacuum glove box

A must-see for those who want to handle materials that dislike moisture and oxygen and cannot be handled in the air, in a vacuum.

After vacuuming the main part of the glove box, it is possible to replace the gas, allowing for the creation of a high-purity gas atmosphere in a short time. Naturally, the pass box can also be vacuum gas replaced. It comes standard with an outlet inside, making it easy to introduce equipment such as balances. The size is compact enough to be placed on a desk, making it ideal for university laboratories. By connecting to an optional gas circulation purification device, it can be used in an environment with oxygen and moisture concentrations below 1 ppm.

  • Other laboratory equipment and containers
  • Glove box
  • Glove box

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Vacuum glove box

Vacuum glove box

Explore new materials in a spacious environment!

After vacuuming the main body of the glove box, it is possible to replace the gas, allowing for the creation of a high-purity gas atmosphere in a short time. The pass box can also be vacuum gas replaced, enabling the transfer of items while maintaining the internal atmosphere. Additionally, it is equipped with a sliding table, making it easy to handle items. A power outlet is standardly equipped inside, allowing for the easy introduction of equipment such as balances. There is ample space without waste, making it easy to introduce equipment inside. By connecting to an optional gas circulation purification device, it can be used in an environment with oxygen and moisture concentrations below 1 ppm.

  • Other laboratory equipment and containers
  • Glove box
  • Glove box

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